Semiconductor Photolithography Lamps & Light Sources

Reliable replacement lamps for exposure tools, aligners, and critical UV processes.

Semiconductor photolithography depends on a stable, high-intensity UV light source. Many optical exposure tools use super high-pressure mercury arc lamps because their output concentrates around the industry-standard photolithography lines—g-line (436 nm), h-line (405 nm), and i-line (365 nm)—supporting repeatable resist exposure and process control. When lamps drift, fail, or become unavailable, it can take an entire tool offline—impacting throughput, yields, and qualification schedules.

SOSCleanroom supports semiconductor and microelectronics teams with photolithography replacement lamps and specialty UV sources, with deep roots in optics and mission-critical lighting continuity. We work with leading manufacturers such as Ushio, whose short-arc mercury lamp families are known for high luminance and ultra-stable arc performance, and whose photolithography UV lamps are engineered specifically to optimize output at the key g/h/i wavelengths. Because short-arc lamps are high-pressure UV sources, proper selection and handling matter—matching the exact lamp code and operating specs helps protect beam uniformity and tool performance, and enclosed operation is essential for safety.

Browse below to find the correct semiconductor lamp by part number and application—so your exposure and inspection systems return to the brightness, stability, and repeatability your process requires.