Meiji MA548 Auxiliary Lens for EMZ-10 — 1.5X Magnification, 64mm Working Distance

The Meiji MA548 is a 1.5X auxiliary (supplementary) lens engineered for Meiji EMZ-10 platform configurations (and referenced by the manufacturer for related EMZ-10 family models). It is typically selected to increase effective magnification for more confident discrimination of fine defects, edge conditions, and small surface features during inspection. The tradeoff is that higher-power auxiliary lenses generally reduce working distance—MA548 is published at 64mm W.D.—so this configuration is best used when operators do not need significant tool clearance under the objective.

Quick selection note: MA548 is commonly treated as a “confirm bench” accessory: use it when discrimination is the limiting constraint. If tool/fixture clearance is limiting, step down to 0.75X / 0.5X / 0.4X options.

Specifications:

Accessory type: Auxiliary lens (auxiliary objective / supplementary lens)
Magnification factor: 1.5X
Working distance (W.D.): 64mm
Primary compatibility: EMZ-10 (manufacturer literature also references EMZ-10H and/or Z-7100 series in certain documents; confirm to your microscope body)
Use intent: Increased discrimination for fine-feature inspection where clearance is not the dominant constraint

Where MA548 Fits in Cleanrooms and Laboratories (and Why)

MA548 is commonly configured on QC confirm stations where the mission is to resolve borderline calls, verify suspected defects, or evaluate fine surface features with greater confidence than a standard configuration. In cleanrooms, the reduced working distance encourages tighter station discipline (covers, controlled handling, and optics hygiene) because small contact events and residue films are more likely to degrade contrast at higher effective magnification.

Typical program fit: confirm benches, higher-detail inspection, failure analysis triage, and defect verification where discrimination is the limiting constraint.

For throughput, many programs pair a scan bench (clearance-first lens) with a confirm bench (detail-first lens like MA548) to reduce decision drift across operators and stations.

MA548 Features:

1.5X auxiliary lens engineered for EMZ-10 family configurations
Designed to increase effective magnification for fine-feature inspection
64mm working distance supports close-in inspection when clearance is not the priority
Supports modular system engineering (swap lens factor to tune clearance vs. discrimination)

MA548 Benefits:

Higher discrimination: improved visibility of fine defects, edge conditions, and small surface features (application dependent).
More confident decisions: reduces “borderline call” uncertainty when paired with standardized illumination and optics hygiene.
Better confirm workflow: supports a two-bench strategy (scan bench + confirm bench) to stabilize inspection results.
Controlled configuration: supports document-controlled station builds for QA/QC repeatability.

Common Applications:

Defect verification and confirm inspection
Fine-feature surface inspection (scratches, nicks, burrs, particulate-like artifacts)
Failure analysis triage and visual documentation workflows (camera system dependent)
Laboratory inspection where higher effective magnification is required

Selection Notes (1.5X vs. 0.75X vs. 0.5X vs. 0.4X)

1.5X (MA548 / 64mm W.D.): confirm/detail configuration—discrimination first; working distance decreases.
0.75X (e.g., MA547 / 127mm W.D.): balanced clearance + discrimination for scan-and-handle benches.
0.5X (e.g., MA546 / 194mm W.D.): clearance-first for more tool/fixture access (effective magnification decreases).
0.4X (e.g., MA558 / 247mm W.D.): maximum clearance where access dominates (lowest effective magnification).

Optics Cleaning (Recommended for Higher-Detail Benches)

Higher-detail configurations are more sensitive to haze, fingerprints, and thin films on optical surfaces. Maintain contrast and reduce “false defect” artifacts using optical-grade swabs and specialty low-lint wipers engineered for coated glass.

Link to Meiji MA548 Product Details / Datasheet: Manufacturer Product Page | Datasheet (PDF)

Related Products Available From SOSCleanroom.com

Meiji EMZ-10 Stereo Microscope Body (Binocular)
Microscope Illuminators — ring lights, fiber optic, and LED illumination
Cleanroom Wipers — supports station wipe-down and contamination control

Notes: Treat auxiliary lens factor as a configuration-controlled input. For repeatable inspection results, document lens factor, eyepieces, illumination, and cleaning cadence at each station.

Product page updated: Jan. 21, 2026 (SOS Technical Staff)

© 2026 SOS Supply. All rights reserved.

The Technical Vault

By SOSCleanroom

Last reviewed: Jan. 21, 2026 | Audience: cleanroom operations, QA/QC, lab managers, manufacturing engineering, EHS

When (and Why) a 1.5X Auxiliary Lens Improves Inspection — Without Breaking Your Workflow

Meiji MA548 — 1.5X factor, 64mm working distance, station design, and configuration control discipline

Confirm bench Working distance tradeoff Stereo vs compound education

The one-paragraph answer

The Meiji MA548 is a 1.5X auxiliary lens with a published 64mm working distance, used on EMZ-10 family configurations to increase effective magnification for more confident defect discrimination. Operationally, MA548 is best treated as a confirm-station configuration: it improves fine-feature visibility, but reduces clearance under the objective. Programs remain stable when MA548 is reserved for confirm calls and paired with a clearance-first scan station.

Field rule: Higher-power auxiliary lenses (1.5X, 2.0X) generally decrease working distance significantly. Use them when discrimination is the constraint—not when tool access is the constraint.

Operational problems MA548 is solving

Borderline calls: operators cannot confidently distinguish stains/films vs true defects at lower effective magnification.
Small-feature discrimination: micro-scratches, edge nicks, burrs, and tiny particulates require more effective magnification.
Confirm workflow drift: without a defined confirm configuration, decisions vary by bench and operator.

Microscopy education: stereo microscope engineering vs. compound microscope engineering

Stereo microscopes are engineered for inspection and manipulation. Dual optical paths provide depth perception and a modular platform: stands, illumination, eyepieces, and auxiliary lenses tune a station to the dominant constraint (clearance, coverage, or discrimination). MA548 exists because stereo microscopy is frequently a production/QC tool where station configuration must match workflow reality.

Compound microscopes are typically optimized for higher magnification analytical viewing (often slide-based) using a single optical axis and transmitted illumination. They prioritize objective/condenser performance and alignment rather than tool clearance—excellent for analytical microscopy, but not the default architecture for hands-on manipulation.

Why this matters: MA548 is a discrimination tool. If your process requires frequent manipulation under the objective, configure a scan station for clearance and reserve MA548 for confirm calls.

Best-practice bench model: scan station + confirm station

For throughput and repeatability, define a two-station model: a scan/handle station (clearance-first auxiliary lens) for coverage and manipulation, and a confirm station (detail-first auxiliary lens like MA548) for borderline calls. This reduces false rejects/accepts and prevents configuration-driven decision drift.

Configuration control checklist (SOP-ready)

Microscope body model (EMZ-10 / EMZ-10H per installed platform)
Auxiliary lens factor installed (MA548 1.5X)
Eyepiece model/magnification (pair-matched)
Stand type + working height (documented)
Illumination type + standard settings (reduce glare artifacts)
Optics cleaning method and interval (documented)

Optics hygiene discipline (artifact control)

At higher effective magnification, small amounts of haze or residue can be misread as defects. Implement an optics-care routine using optical-grade swabs and low-lint wipers, and avoid reusing loaded cleaning surfaces.

Suggested optics-cleaning SOP insert (template-style)

Remove loose particles before wiping to avoid dragging grit across coated optics.
Use a fresh optical swab/wiper; lightly dampen with minimal approved solvent.
Wipe gently in one direction; avoid heavy pressure and repeated scrubbing.
Replace the cleaning surface frequently; do not reuse loaded swabs/wipers.
Cover the microscope when idle to reduce airborne deposition.

Helpful links

Source basis

SOSCleanroom product listing context (application positioning and station role language).
Manufacturer MA548 product page and datasheet (1.5X factor and 64mm working distance; EMZ-10 family compatibility).
Common inspection microscopy best practices: scan vs confirm station design, configuration control, and optics hygiene discipline.

Compliance note: This Technical Vault article is provided for educational support. Always follow facility SOPs, QA requirements, and validation/qualification plans.

Document control: Rev. Jan. 21, 2026 (SOS Technical Staff)